Full-field exposure control implications of the mask error function [6155-12]

Author(s):

Zavecz, T. E. ( TEA Systems (USA) )  

Publication title:

Data analysis and modeling for process control III : 23 February, 2006, San Jose, California, USA

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

6155

Pub. Year:

2006

Page(from):

61550E

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819461988 [0819461989]

Language:

English

Call no.:

P63600/6155

Type:

Conference Proceedings