Advanced process control of poly silicon gate critical dimensions [6155-09]
- Author(s):
- Rudolph, P. ( LSI Logic Corp. (USA) )
- Publication title:
- Data analysis and modeling for process control III : 23 February, 2006, San Jose, California, USA
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 6155
- Pub. Year:
- 2006
- Page(from):
- 61550B
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819461988 [0819461989]
- Language:
- English
- Call no.:
- P63600/6155
- Type:
- Conference Proceedings
Similar Items:
SPIE - The International Society for Optical Engineering |
7
Conference Proceedings
Advanced profile control and the impact of sidewall angle at gate etch for critical nodes
Society of Photo-optical Instrumentation Engineers |
2
Conference Proceedings
Advanced process control for poly-Si gate etching using integrated CD metrology
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
9
Conference Proceedings
Advanced exposure and focus control by proximity profile signature matching [6155-16]
SPIE - The International Society of Optical Engineering |
4
Conference Proceedings
Evaluation of an advanced process control solution to detect wafer positioning issues within the hot and cold plate modules of a lithography track [6155-19]
SPIE - The International Society of Optical Engineering |
10
Conference Proceedings
The Vertical Replacement-Gate (VRG) MOSFET: A High-Performance, Vertical MOSFET with Lithography-Independent Critical Dimensions
Electrochemical Society |
5
Conference Proceedings
Elements of Thermodynamics for the Understanding and Design of Crystal Growth Processes
Trans Tech Publications |
Kluwer Academic Publishers |
SPIE-The International Society for Optical Engineering |
12
Conference Proceedings
Full-chip poly gate critical dimension control using model based lithography verification [5992-186]
SPIE - The International Society of Optical Engineering |