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Application of integrated scatterometry measurements for a wafer-level litho feed-back loop in a high-volume 300 mm DRAM production environment [6155-27]

Author(s):
Kramer, U. ( Infineon Technologies SC300 GmbH & Co. OHG (Germany) )
Fleischer, G. ( Infineon Technologies SC300 GmbH & Co. OHG (Germany) )
Marschner, T. ( Infineon Technologies SC300 GmbH & Co. OHG (Germany) )
Hornig, S. ( Infineon Technologies SC300 GmbH & Co. OHG (Germany) )
Weichert, H. ( Tokyo Electron Deutschland GmbH (Germany) )
Hetzer, D. ( Timbre Technologies, Inc. (USA) )
1 more
Publication title:
Data analysis and modeling for process control III : 23 February, 2006, San Jose, California, USA
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6155
Pub. Year:
2006
Page(from):
615509
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819461988 [0819461989]
Language:
English
Call no.:
P63600/6155
Type:
Conference Proceedings

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