Sub-40 nm pattern fabrication in 157 nm interferometric immersion lithography [6154-173]

Sub-40 nm pattern fabrication in 157 nm interferometric immersion lithography [6154-173]

Author(s):

Hagiwara T ( Semiconductor Leading Edge Technologies Inc (Japan) )

Tsuji S ( Semiconductor Leading Edge Technologies Inc (Japan) )

Fujii, K ( Semiconductor Leading Edge Technologies Inc (Japan) )

Moriya M ( Komatsu Ltd (Japan) )

Wakabayashi O ( Komatsu Ltd (Japan) )

Sumitani A ( Komatsu Ltd (Japan) )

Saotp Y ( Central Glass Co.. Ltd. (Japan) )

Maeda K ( Central Glass Co.. Ltd. (Japan) )

3 more

Publication title:

Optical Microlithography XIX

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

6154

Pub. Year:

2006

Pt.:

3

Page(from):

61544H

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819461971 [0819461970]

Language:

English

Call no.:

P63600/6154

Type:

Conference Proceedings

Details

TDL ID:	ZA00016186
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Optical Microlithography
Conf. info. (Number):	2006 : 19th
Conf. info. (Venue):	San Jose, CA, USA
Conf. info. (Date):	2006.02.21-2006.02.24

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