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Methodology to set up mask CD specification including MEEF and process sensitivity of mask CD error [6154-167]

Author(s):
  • Shim, Y. A. ( DongbuAnam Semiconductor (South Korea) )
  • Park, S. J. ( DongbuAnam Semiconductor (South Korea) )
  • Kim, J.-H. ( DongbuAnam Semiconductor (South Korea) )
  • Kim, K. ( DongbuAnam Semiconductor (South Korea) )
Publication title:
Optical Microlithography XIX
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6154
Pub. Year:
2006
Pt.:
3
Page(from):
61544B
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819461971 [0819461970]
Language:
English
Call no.:
P63600/6154
Type:
Conference Proceedings

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