Alternating PSM balancing characterization: a comparative study using AIMS and wafer print data [6154-163]
- Author(s):
- Sczyrba, M. ( Advanced Mask Technology Ctr. GmbH & Co. KG (Germany) )
- Kahle, R. ( Infineon Technologies AG (Germany) )
- Bubke, K. ( Advanced Mask Technology Ctr. GmbH & Co. KG (Germany) )
- Pforr, R. ( Infineon Technologies SC300 GmbH & Co. KG (Germany) )
- Neubauer, R. ( Advanced Mask Technology Ctr. GmbH & Co. KG (Germany) )
- Publication title:
- Optical Microlithography XIX
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 6154
- Pub. Year:
- 2006
- Pt.:
- 3
- Page(from):
- 615448
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819461971 [0819461970]
- Language:
- English
- Call no.:
- P63600/6154
- Type:
- Conference Proceedings
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