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Efficient OPC model generation and verification for focus variation [6154-128]

Author(s):
Park, Y. H. ( Samsung Electronics Co, Ltd. (South Korea) )
Ban, Y. C. ( Samsung Electronics Co, Ltd. (South Korea) )
Hur, D. H. ( Samsung Electronics Co, Ltd. (South Korea) )
Kim, D. -H. ( Samsung Electronics Co, Ltd. (South Korea) )
Hong, J. -S. ( Samsung Electronics Co, Ltd. (South Korea) )
Yoo, M. -H. ( Samsung Electronics Co, Ltd. (South Korea) )
Kong, J. T. ( Samsung Electronics Co, Ltd. (South Korea) )
2 more
Publication title:
Optical Microlithography XIX
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6154
Pub. Year:
2006
Pt.:
3
Page(from):
61543B
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819461971 [0819461970]
Language:
English
Call no.:
P63600/6154
Type:
Conference Proceedings

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