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A methodology to take LER effect into OPC modeling algorithm [6154-125]

Author(s):
  • Hung, C. Y. ( Semiconductor Manufacturing International Corp. (China) )
  • Liu, Q. ( Semiconductor Manufacturing International Corp. (China) )
  • Deng, Z. ( Semiconductor Manufacturing International Corp. (China) )
  • Zhang, L. ( Mentor Graphics Corp. (China) )
Publication title:
Optical Microlithography XIX
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6154
Pub. Year:
2006
Pt.:
3
Page(from):
615439
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819461971 [0819461970]
Language:
English
Call no.:
P63600/6154
Type:
Conference Proceedings

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