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Simulation of mask induced polarization effect on imaging in immersion lithography [6154-105]

Author(s):
Kwak, E. A. ( Hanyang Univ. (South Korea) )
Jung, M. R. ( Hanyang Univ. (South Korea) )
Kim, D.-G. ( Hanyang Univ. (South Korea) )
Lee, J.-E. ( Hanyang Univ. (South Korea) )
Oh, H.-K. ( Hanyang Univ. (South Korea) )
Lee, S. ( Samsung Electronics (South Korea) )
1 more
Publication title:
Optical Microlithography XIX
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6154
Pub. Year:
2006
Pt.:
2
Page(from):
61542T
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819461971 [0819461970]
Language:
English
Call no.:
P63600/6154
Type:
Conference Proceedings

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