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Heterogeneous diffusion model for simulation of resist process [6154-104]

Author(s):
  • Lim, C. M. ( Hynix Semiconductor Inc. (South Korea) )
  • Park, J. T. ( Hynix Semiconductor Inc. (South Korea) )
  • Kim, S. M. ( Hynix Semiconductor Inc. (South Korea) )
  • Kim, H. S. ( Hynix Semiconductor Inc. (South Korea) )
  • Moon, S. C. ( Hynix Semiconductor Inc. (South Korea) )
Publication title:
Optical Microlithography XIX
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6154
Pub. Year:
2006
Pt.:
2
Page(from):
61542S
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819461971 [0819461970]
Language:
English
Call no.:
P63600/6154
Type:
Conference Proceedings

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