GT40A: durable 45-W ArF injection-lock laser light source fordryjimmersion lithography [6154-99]

GT40A: durable 45-W ArF injection-lock laser light source fordryjimmersion lithography [6154-99]

Author(s):

Tanaka, S. ( Gigaphoton Inc. (Japan) )

Tsushima, H. ( Gigaphoton Inc. (Japan) )

Nakaike, T. ( Gigaphoton Inc. (Japan) )

Yamazaki, T. ( Gigaphoton Inc. (Japan) )

Saito, T. ( Gigaphoton Inc. (Japan) )

Tomaru, H. ( Gigaphoton Inc. (Japan) )

Kakizaki, K. ( Ushio Inc. (Japan) )

Matsunaga, T. ( Komatsu Ltd. (Japan) )

Suzuki, T. ( Komatsu Ltd. (Japan) )

Wakabayashi, O. ( Komatsu Ltd. (Japan) )

Nagai, S. ( Komatsu Ltd. (Japan) )

Fujimoto, J. ( Komatsu Ltd. (Japan) )

Inoue, T. ( Ushio Inc (Japan) )

Mizoguchi, H ( Komatsu Ltd. (Japan) )

9 more

Publication title:

Optical Microlithography XIX

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

6154

Pub. Year:

2006

Pt.:

2

Page(from):

61542O

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819461971 [0819461970]

Language:

English

Call no.:

P63600/6154

Type:

Conference Proceedings

Details

TDL ID:	ZA00016186
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Optical Microlithography
Conf. info. (Number):	2006 : 19th
Conf. info. (Venue):	San Jose, CA, USA
Conf. info. (Date):	2006.02.21-2006.02.24

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