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Application of super-diffraction lithography (SOL) for an actual device fabrication [6154-84]

Author(s):
Nakao, S. ( Renesas Technology Corp. (Japan) )
Maejima, S. ( Renesas Technology Corp. (Japan) )
Kanai, I. ( Renesas Technology Corp. (Japan) )
Nakae, A. ( Renesas Technology Corp. (Japan) )
Sakai, J. ( Renesas Technology Corp. (Japan) )
Narimatsu, K. ( Renesas Technology Corp. (Japan) )
Suko, K. ( Renesas Technology Corp. (Japan) )
2 more
Publication title:
Optical Microlithography XIX
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6154
Pub. Year:
2006
Pt.:
2
Page(from):
61542A
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819461971 [0819461970]
Language:
English
Call no.:
P63600/6154
Type:
Conference Proceedings

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