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193-nm immersion photomask image placement in exposure tools [6154-52]

Author(s):
Cotte, E. ( Andvanced Mask Technology Ctr (Germay) )
Alles, B. ( Tu Munchen (Germany) )
Wandel, T. ( Andvanced Mask Technology Ctr (Germay) )
Antesberger G ( Andvanced Mask Technology Ctr (Germay) )
Teuber S ( Andvanced Mask Technology Ctr (Germay) )
Vorwerk M ( Infineon Technologies AG (Germany) )
Fangen A ( Infineon Technologies AG (Germany) )
Katzwinkel F ( Infineon Technologies AG (Germany) )
3 more
Publication title:
Optical Microlithography XIX
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6154
Pub. Year:
2006
Pt.:
1
Page(from):
61541F
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819461971 [0819461970]
Language:
English
Call no.:
P63600/6154
Type:
Conference Proceedings

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