Second generation fluids for 193nm immersion lithography [6154-42]

Second generation fluids for 193nm immersion lithography [6154-42]

Author(s):

French, R. H. ( DuPont Co. (USA) )

Qiu, W. ( DuPont Co. (USA) )

Yang, M. K. ( DuPont Co. (USA) )

Wheland, R. C. ( DuPont Co. (USA) )

Lemon, M. F. ( DuPont Co. (USA) )

Shoe, A. L. ( DuPont Co. (USA) )

Adelman, D. J. ( DuPont Co. (USA) )

Crawford, M. K. ( DuPont Co. (USA) )

Tran, H. V. ( DuPont Co. (USA) )

Feldman, J. ( DuPont Co. (USA) )

McLain, S. J. ( DuPont Co. (USA) )

Peng, S. ( DuPont Co. (USA) )

7 more

Publication title:

Optical Microlithography XIX

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

6154

Pub. Year:

2006

Pt.:

1

Page(from):

615415

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819461971 [0819461970]

Language:

English

Call no.:

P63600/6154

Type:

Conference Proceedings

Details

TDL ID:	ZA00016186
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Optical Microlithography
Conf. info. (Number):	2006 : 19th
Conf. info. (Venue):	San Jose, CA, USA
Conf. info. (Date):	2006.02.21-2006.02.24

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