Positive and negative tone double patterning lithography for 50nm flash memory [6154-37]
- Author(s):
Lim, C. M. ( Hynix Semiconductor Inc. (South Korea) ) Kim, S. M. ( Hynix Semiconductor Inc. (South Korea) ) Hwang, Y. S. ( Hynix Semiconductor Inc. (South Korea) ) Choi, J. -S. ( Hynix Semiconductor Inc. (South Korea) ) Ban, K. -D. ( Hynix Semiconductor Inc. (South Korea) ) Cho, S. -Y. ( Hynix Semiconductor Inc. (South Korea) ) Jung, J. K. ( Hynix Semiconductor Inc. (South Korea) ) Knag, E. -K. ( Hynix Semiconductor Inc. (South Korea) ) Lim, H. -Y. ( Hynix Semiconductor Inc. (South Korea) ) Kim, H. -S. ( Hynix Semiconductor Inc. (South Korea) ) Moon, S. -C. ( Hynix Semiconductor Inc. (South Korea) ) - Publication title:
- Optical Microlithography XIX
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 6154
- Pub. Year:
- 2006
- Pt.:
- 1
- Page(from):
- 615410
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819461971 [0819461970]
- Language:
- English
- Call no.:
- P63600/6154
- Type:
- Conference Proceedings
Similar Items:
SPIE - The International Society of Optical Engineering |
7
Conference Proceedings
Comparison between optical proximity effect of positive and negative tone patterns in KrF lithography
SPIE-The International Society for Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
9
Conference Proceedings
Resolution enhanced top anti-reflective coating materials for ArF immersion lithography [6153-74]
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
10
Conference Proceedings
Improvement of alignment and overlay accuracy on amorphous carbon layers [6152-73]
SPIE - The International Society of Optical Engineering |
5
Conference Proceedings
Patterning with spacer for expanding the resolution limit of current lithography tool [6156-27]
SPIE - The International Society of Optical Engineering |
11
Conference Proceedings
A simple and accurate resist parameter extraction method for sub-80-nm DRAM patterns
SPIE - The International Society of Optical Engineering |
6
Conference Proceedings
Advanced module-based approach to effective CD prediction of sub-100nm patterns
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |