Effects of laser bandwidth on OPE in a modern lithography tool [6154-36]
- Author(s):
Huggins, K. ( Intel Corp. (USA) ) Tsuyoshi, T. ( Nikon Corp. (Japan) ) Ong, M. ( Nikon Precision, Inc.(USA) ) Rafac, R. ( Cymer Inc. (USA) ) Treadway, C. ( Intel Corp. (USA) ) Choudhary, D. ( Intel Corp. (USA) ) Kudo, T. ( Nikon Corp. (Japan) ) Hirukawa, S. ( Nikon Corp. (Japan) ) Renwick, S. P. ( Nikon Precision, Inc. (USA) ) Farrar, N. R. ( Cymer Inc. (USA) ) - Publication title:
- Optical Microlithography XIX
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 6154
- Pub. Year:
- 2006
- Pt.:
- 1
- Page(from):
- 61540Z
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819461971 [0819461970]
- Language:
- English
- Call no.:
- P63600/6154
- Type:
- Conference Proceedings
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