Immersion effects on lithography system performance [6154-30]
- Author(s):
Nagahara, S. ( NEC Electronics Corp. (Japan) and IMEC (Belgium) ) Pollentier, I. ( IMEC (Belgium) ) Machida, T. ( Renesas Technology (Japan) and IMEC (Belgium) ) O’Brien, S. ( Texas Instruments (USA) and IMEC (Belgium) ) Jacobs, E. ( ASML (Netherlands) and IMEC (Belgium) ) Schaap, C. ( ASML (Netherlands) and IMEC (Belgium) ) Leroy, P. ( IMEC (Belgium) ) Storms, G. ( IMEC (Belgium) ) Nafus, K. ( Tokyo Electron (Japan) and IMEC (Belgium) ) Laidler, D. ( IMEC (Belgium) ) Cheng, S. - Publication title:
- Optical Microlithography XIX
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 6154
- Pub. Year:
- 2006
- Pt.:
- 1
- Page(from):
- 61540U
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819461971 [0819461970]
- Language:
- English
- Call no.:
- P63600/6154
- Type:
- Conference Proceedings
Similar Items:
1
Conference Proceedings
Comparison of back side chrome focus monitor to focus self-metrology of an immersion scanner
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
8
Conference Proceedings
Experimental characterization of the receding meniscus under conditions associated with immersion lithography [6154-27]
SPIE - The International Society of Optical Engineering |
3
Conference Proceedings
Basic studies of overlay performance on immersion lithography tool [6154-26]
SPIE - The International Society of Optical Engineering |
9
Conference Proceedings
Simulation of sub-90-nm node complementary phase-shift processes with ArF lithography
SPIE-The International Society for Optical Engineering |
4
Conference Proceedings
Characterization. of imaging performance for immersion lithography at NA=0.93 [6154-05]
SPIE - The International Society of Optical Engineering |
10
Conference Proceedings
Advanced process control for hyper-NA lithography based on CD-SEM measurement
SPIE - The International Society of Optical Engineering |
5
Conference Proceedings
Immersion specific defect mechanisms: findings and recommendations for their control [6154-180]
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
6
Conference Proceedings
Analysis and improvement of defectivity in immersion lithography [6154-175]
SPIE - The International Society of Optical Engineering |
12
Conference Proceedings
XLR 600i: recirculating ring ArF light source for double patterning immersion lithography
Society of Photo-optical Instrumentation Engineers |