Blank Cover Image

MEEF-based correction to achieve OPC convergence of low-kl lithography with strong OAI [6154-25]

Author(s):
  • Choi, S. H. ( Samsung Electronics Co., Ltd. (South Korea) )
  • Je, A Y. ( Samsung Electronics Co., Ltd. (South Korea) )
  • Hong, J. S. ( Samsung Electronics Co., Ltd. (South Korea) )
  • Yoo, M.-H ( Samsung Electronics Co., Ltd. (South Korea) )
  • Kong, J.-T ( Samsung Electronics Co., Ltd. (South Korea) )
Publication title:
Optical Microlithography XIX
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6154
Pub. Year:
2006
Pt.:
1
Page(from):
61540P
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819461971 [0819461970]
Language:
English
Call no.:
P63600/6154
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings OPC and verification accuracy enhancement using the 2D wafer image for the low kl memory devices [6154-19]

Ban, Y. C., Lee, D. Y., Hong, J. S., Yoo, M. H., Kong, J.-T.

SPIE - The International Society of Optical Engineering
7 Conference Proceedings New OPC methods to increase process margin for sub-70nm devices

Hong, J. -S., Kim, D. -H., Kim, S. -W., Yoo, M. -H., Kong, J. -T.

SPIE - The International Society of Optical Engineering
2 Conference Proceedings 25 nm immersion lithography at 193 nm wavelength

Choi, S.-H., Park, T.-H., Kim, E., Youn, H.-J., Lee, D.-Y., Ban, Y.-C., Je, A.-Y., Kim, D.-H., Hong, J.-S., Kim, Y.-H., …

SPIE - The International Society of Optical Engineering
8 Conference Proceedings DFM based on layout restriction and process window verification for sub-60nm memory devices

S. -H. Choi, D. -H. Jung, J. -S. Hong, J. -H. Choi, M. -H. Yoo, J. -T. Kong

SPIE - The International Society of Optical Engineering
3 Conference Proceedings Efficient OPC model generation and verification for focus variation [6154-128]

Park, Y. H., Ban, Y. C., Hur, D. H., Kim, D. -H., Hong, J. -S., Yoo, M. -H., Kong, J. T.

SPIE - The International Society of Optical Engineering
9 Conference Proceedings Mask topography effect on OPC at hyper NA lithography [6154-64]

Lee S, Kim I. S, Chun Y. J, Kim S.-W, Lee S.J, Wood, S.-G, Cho H. K, Moon J.-T

SPIE - The International Society of Optical Engineering
4 Conference Proceedings Simulation-based critical-area extraction and litho-friendly layout design for low-k1 lithography

Choi, S.-H., Ban, Y.-C., Lee, K.-H., Kim, D.-H., Hong, J.-S., Kim, Y.-H., Yoo, M.-H., Kong, J.-T.

SPIE - The International Society of Optical Engineering
10 Conference Proceedings Effect of lens aberrations on OPC model accuracy for low kl lithography process [6154-116]

Ahn J. K, Jeong C. Y, Park J.-L, Choi J.-S, Lee J.-G

SPIE - The International Society of Optical Engineering
5 Conference Proceedings Accurate gate CD control through the full-chip area using the dual model in the model-based OPC

Hong, J.-S., Park, C.-H., Kim, D.-H., Choi, S.-H., Ban, Y.-C., Kim, Y.-H., Yoo, M.-H., Kong, J.-T.

SPIE - The International Society of Optical Engineering
11 Conference Proceedings Hybrid PPC methodology using multi-step correction and implementation for the sub-100-nm node

Choi, S.-H., Park, J.-S., Park, C.-H., Chung, W.-Y., Kim, I.-S., Kim, D.-H., Kim, Y.-H., Yoo, M.-H., Kong, J.-T.

SPIE-The International Society for Optical Engineering
6 Conference Proceedings RuMBa: a rule-model OPC for low MEEF 130-nm KrF lithography

Hsu,S., Shi,X., Hsu,M., Corcoran,N.P., Chen,J.F., Desai,S., Sherrill,M.J., Tseng,Y.C., Chang,H.A., Kao,J.F., Tseng,A., …

SPIE-The International Society for Optical Engineering
12 Conference Proceedings 100-nm-scale electroplated nickel stamper fabricated by e-beam lithography on chrome/quartz mask

Choi, D.-S., Yoo, Y.-E., Seo, Y. H., Lee, J.-H., Je, T.-J., Whang, K.-H.

SPIE - The International Society of Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12