Alt-phase shift mask technology for 65nm logic applications [6154-22]

Alt-phase shift mask technology for 65nm logic applications [6154-22]

Author(s):

Chakravorty, K. K. ( Intel Corp. (USA) )

Henrichs, S. ( Intel Corp. (USA) )

Qiu, W. ( Intel Corp. (USA) )

Chavez, J. L. ( Intel Corp. (USA) )

Liu, Y.-P. ( Intel Corp. (USA) )

Ghadiali, F. ( Intel Corp. (USA) )

Yung, K. ( Intel Corp. (USA) )

Wilcox, N. ( Intel Corp. (USA) )

Silva, M. ( Intel Corp. (USA) )

Ma, J. ( Intel Corp. (USA) )

Wu, P. ( Intel Corp. (USA) )

Irvine, B. ( Intel Corp. (USA) )

Yun, H. ( Intel Corp (USA) )

Cheng, W H ( Intel Corp (USA) )

Farnsworth, J ( Intel Corp (USA) )

10 more

Publication title:

Optical Microlithography XIX

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

6154

Pub. Year:

2006

Pt.:

1

Page(from):

61540M

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819461971 [0819461970]

Language:

English

Call no.:

P63600/6154

Type:

Conference Proceedings

Details

TDL ID:	ZA00016186
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Optical Microlithography
Conf. info. (Number):	2006 : 19th
Conf. info. (Venue):	San Jose, CA, USA
Conf. info. (Date):	2006.02.21-2006.02.24

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