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OPC and verification accuracy enhancement using the 2D wafer image for the low kl memory devices [6154-19]

Author(s):
  • Ban, Y. C. ( Samsung Electronics Co., Ltd. (South Korea) )
  • Lee, D. Y. ( Samsung Electronics Co., Ltd. (South Korea) )
  • Hong, J. S. ( Samsung Electronics Co., Ltd. (South Korea) )
  • Yoo, M. H. ( Samsung Electronics Co., Ltd. (South Korea) )
  • Kong, J.-T. ( Samsung Electronics Co., Ltd. (South Korea) )
Publication title:
Optical Microlithography XIX
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6154
Pub. Year:
2006
Pt.:
1
Page(from):
61540J
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819461971 [0819461970]
Language:
English
Call no.:
P63600/6154
Type:
Conference Proceedings

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