Validity of the Hopkins approximation in simulations of hyper NA(NA>l) line-space structures for an attenuated PSM mask [6154-16]
- Author(s):
Erdmann, A. ( Fraunhofer Institute of Integrated Systems and Device Technology (Germany) ) Citarella, G. ( Fraunhofer Institute of Integrated Systems and Device Technology (Germany) ) Evanschitzky, P. ( Fraunhofer Institute of Integrated Systems and Device Technology (Germany) ) Schermer, H. ( Fraunhofer Institute of Integrated Systems and Device Technology (Germany) ) Philipsen, V. ( IMEC (Belgium) ) De Bisschop, P. ( IMEC (Belgium) ) - Publication title:
- Optical Microlithography XIX
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 6154
- Pub. Year:
- 2006
- Pt.:
- 1
- Page(from):
- 61540g
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819461971 [0819461970]
- Language:
- English
- Call no.:
- P63600/6154
- Type:
- Conference Proceedings
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