Enabling the 45nm node by hyper-NA polarized lithography [6154-11]
- Author(s):
De Boeij, W. ( ASML Netherlands B.V. (Netherlands) ) Swinkels, G ( ASML Netherlands B.V. (Netherlands) ) Le Masson, N. ( ASML Netherlands B.V. (Netherlands) ) Koolen, A. ( ASML Netherlands B.V. (Netherlands) ) Van Greevembroek, H. ( ASML Netherlands B.V. (Netherlands) ) Klaassen, M. ( ASML Netherlands B.V. (Netherlands) ) Van de Kerkhof, M. ( ASML Netherlands B.V. (Netherlands) ) Van Ingen Schenau, K. ( ASML Netherlands B.V. (Netherlands) ) De Winter, L. ( ASML Netherlands B.V. (Netherlands) ) Wehrens, M. ( ASML Netherlands B.V. (Netherlands) ) Hansen, S. ( ASML Netherlands B.V. (Netherlands) ) Wagner, C. ( ASML Netherlands B.V. (Netherlands) ) - Publication title:
- Optical Microlithography XIX
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 6154
- Pub. Year:
- 2006
- Pt.:
- 1
- Page(from):
- 61540B
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819461971 [0819461970]
- Language:
- English
- Call no.:
- P63600/6154
- Type:
- Conference Proceedings
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