The next phase for immersion lithography [6154-06]

The next phase for immersion lithography [6154-06]

Author(s):

Sewell, H. ( ASML US (USA) )

Mulkens, J. ( ASML Netherlands B.V. (Netherlands) )

McCafferty, D. ( ASML US (USA) )

Markoya, L. ( ASML US (USA) )

Streefkerk, B. ( ASML Netherlands B.V. (Netherlands) )

Graeupner, P. ( Zeiss-SMT (Germany) )

1 more

Publication title:

Optical Microlithography XIX

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

6154

Pub. Year:

2006

Pt.:

1

Page(from):

615406

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819461971 [0819461970]

Language:

English

Call no.:

P63600/6154

Type:

Conference Proceedings

Details

TDL ID:	ZA00016186
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Optical Microlithography
Conf. info. (Number):	2006 : 19th
Conf. info. (Venue):	San Jose, CA, USA
Conf. info. (Date):	2006.02.21-2006.02.24

Similar Items:

1 Conference Proceedings High-n immersion lithography H. Sewell, J. Mulkens, P. Graeupner, D. McCafferty, L. Markoya Society of Photo-optical Instrumentation Engineers	7 Conference Proceedings Immersion lithography with an ultrahigh-NA in-line catadioptric lens and a high-transmission flexible polarization illumination system [6154-69] Jasper, H., Modderman, T., Van de Kerkhof, M., Wagner, C., Mulkens, J., De. Bodij, W., Van Seten, E, Kneer, B. SPIE - The International Society of Optical Engineering
2 Conference Proceedings Extending immersion lithography with high-index materials: results of a feasibility study H. Sewell, J. Mulkens, P. Graeupner, D. McCafferty, L. Markoya, S. Donders, N. Samarakone, R. Duesing SPIE - The International Society of Optical Engineering	8 Conference Proceedings Development of cleaning process for immersion lithography [6154-184] Chang, C. Y., Yu D C, Lin J C H, Lin B J SPIE - The International Society of Optical Engineering
3 Conference Proceedings Extending optical lithography with immersion Streefkerk, B., Baselmans, J., Gehoel-van Ansem, W., Mulkens, J., Hoogendam, C., Hoogendorp, M., Flagello, D.G., Sewell, … SPIE - The International Society of Optical Engineering	9 Conference Proceedings 157-nm Micrascan VII initial lithography results Sewell, H., Tirri, B.A., O'Neil, T., Fahey, T.J., McCafferty, D.C., Reid, P.B., McClay, J.A. SPIE-The International Society for Optical Engineering
4 Conference Proceedings ArF immersion lithography using TWINSCAN technology Mulkens, J., Streefkerk, B., Haagendorp, M. SPIE - The International Society of Optical Engineering	10 Conference Proceedings Immersion specific defect mechanisms: findings and recommendations for their control [6154-180] Kocsis, M., Van Den Heuvel, D., Gronheid, R., Maenhoudt, M., Vangoidsenhoven, D., Wells, G., Stepanenko, N., Benndorf, … SPIE - The International Society of Optical Engineering
5 Conference Proceedings Defects, overlay, and focus performance improvements with five generations of immersion exposure systems J. Mulkens, B. Streefkerk, H. Jasper, J. de Klerk, F. de Jong, L. Levasier, M. Leenders SPIE - The International Society of Optical Engineering	11 Conference Proceedings A dive into clear water: immersion defect capabilities [6154-28] Streefkerk, B., Nulkens, J., Moerman, R., Stacenga, M., Van der Hoeven, J., Grouwstra, C., Bruis, R., Leenders, M., … SPIE - The International Society of Optical Engineering
6 Conference Proceedings Exploring the resolution limits of phase-shift mask lithography with a very high numerical aperture ArF step-and-scan system Sewell, H., Raval, P., McCafferty, D.C. SPIE-The International Society for Optical Engineering	12 Conference Proceedings Watermark defect formation and removal for immersion lithography [6154-44] Chang, C. Y., Yu, D. C., Lin, J. C. H., Lin, B. J. SPIE - The International Society of Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12