Development of optimized filter for TARC and developer with the goal of having small pore size and minimizing microbubble reduction [6153-174]
- Author(s):
Umeda, T. ( Nihon Pall Ltd. (Japan) ) Tsuzuki, S. ( Nihon Pall Ltd. (Japan) ) Boucher, M. ( Wafer Tech LLC (USA) ) Dinh, H. ( Wafer Tech LLC (USA) ) Ma, L. C. ( Wafer Tech LLC (USA) ) Boten, R. ( Wafer Tech LLC (USA) ) - Publication title:
- Advances in Resist Technology and Processing XXIII
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 6153
- Pub. Year:
- 2006
- Pt.:
- 2
- Page(from):
- 61534L
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819461964 [0819461962]
- Language:
- English
- Call no.:
- P63600/6153
- Type:
- Conference Proceedings
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