Blank Cover Image

Design and development of next-generation bottom anti-reflective coatings for 45.nm process with hyper NA lithography [6153-96]

Author(s):
Nakajima, M. ( Nissan Chemical Industries, Ltd.(Japan) )
Sakaguchi, T. ( Nissan Chemical Industries, Ltd.(Japan) )
Hashimoto, K. ( Nissan Chemical Industries, Ltd.(Japan) )
Sakamoto, R. ( Nissan Chemical Industries, Ltd.(Japan) )
Klshioko, T. ( Nissan Chemical Industries, Ltd.(Japan) )
Takei, S. ( Nissan Chemical Industries, Ltd.(Japan) )
Enomoto, T. ( Nissan Chemical Industries, Ltd.(Japan) )
Nakajima, Y. ( Nissan Chemical Industries, Ltd.(Japan) )
3 more
Publication title:
Advances in Resist Technology and Processing XXIII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6153
Pub. Year:
2006
Pt.:
2
Page(from):
61532L
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819461964 [0819461962]
Language:
English
Call no.:
P63600/6153
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings New 193-nm bottom anti-reflective coatings

Nakayama, K., Kishioka, T., Arase, S., Sakamoto, R., Hiroi, Y., Nakajima, Y.

SPIE-The International Society for Optical Engineering
7 Conference Proceedings BARC (bottom anti-reflective coating) for immersion process

Y. Hiroi, T. Kishioka, R. Sakamoto, D. Maruyama, T. Ohashi, T. Ishida, S. Kimura, Y. Sakaida, H. Watanabe

SPIE - The International Society of Optical Engineering
2 Conference Proceedings Bottom anti-reflective coatings for 193-nm bilayer system

Takahiro Sakaguchi, Tomoyuki Enomoto, Yasuyuki Nakajima

SPIE - The International Society of Optical Engineering
8 Conference Proceedings Optimization of 248nm bottom anti-reflective coatings with thin film and high etch rate on real device

MyoungSoo Kim, HakJoon Kim, KewChan Shim, JeHa Jeon, MyungGoon Gil, YongWook Song, Tomoyuki Enomoto, Takahiro Sakaguchi, …

SPIE - The International Society of Optical Engineering
3 Conference Proceedings Multilayer BARCs for hyper-NA immersion lithography process

Y. Sakaida, S. Takei, M. Nakajima, S. Kimura, T. Sakaguchi, K. Hashimoto, H. Imamura

SPIE - The International Society of Optical Engineering
9 Conference Proceedings Bottom anti-reflective coating for hyper NA process: theory, application, and material development

H. Yao, J. Cho, J. Yin, S. Mullen, G. Lin

Society of Photo-optical Instrumentation Engineers
4 Conference Proceedings Thin film and high-etch-rate type 248-nm bottom antireflective coatings

Enomoto, T., Takei, S., Kishioka, T., Hatanaka, T., Sakamoto, R., Nakajima, Y.

SPIE - The International Society of Optical Engineering
10 Conference Proceedings Development of multi-layer process materials for hyper-NA lithography process

Y. Sakaida, M. Nakajima, T. Shinjo, K. Hashimoto

Society of Photo-optical Instrumentation Engineers
5 Conference Proceedings Development of organic bottom antireflective coating for 157-nm lithography

Irie, S., Shigematsu, M., Miyoshi, S., Sakamoto, R., Mizusawa, K., Nakajima, Y., Itani, T.

SPIE-The International Society for Optical Engineering
11 Conference Proceedings New advanced BARC and gap fill materials based on sublimate reduction for 193nm lithography [6153-101]

Takei S, Shinjo T, Horiguchi, Y., Nakajima Y

SPIE - The International Society of Optical Engineering
6 Conference Proceedings High-etch-rate bottom-antireflective coating and gap-fill materials using dextrin derivatives in via first dual-damascene lithography process

S. Takei, Y. Sakaida, T. Shinjo, K. Hashimoto, Y. Nakajima

Society of Photo-optical Instrumentation Engineers
12 Conference Proceedings Novel approach of UV cross-link process for advanced planarization technology in 32-45 nm lithography

S. Takei, Y. Horiguchi, T. Shinjo, B. Ho, Y. Mano, Y. Nakajima, M. Muramatsu, M. Iwashita, K. Tsuchiya

SPIE - The International Society of Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12