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Wet-recess process optimization of a developer-soluble gap-fill material for planarization of trenches in trench-first dual damascene process [6153-95]

Author(s):
Washburn, C. ( Brewer Scewer Science, Inc. (USA) )
Brakensiek, N. ( Brewer Scewer Science, Inc. (USA) )
Guerrero, A. ( Brewer Scewer Science, Inc. (USA) )
Edwards, K. ( Brewer Scewer Science, Inc. (USA) )
Stroud, C. ( Brewer Scewer Science, Inc. (USA) )
Chapman, N ( Brewer Scewer Science, Inc. (USA) )
1 more
Publication title:
Advances in Resist Technology and Processing XXIII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6153
Pub. Year:
2006
Pt.:
2
Page(from):
61532K
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819461964 [0819461962]
Language:
English
Call no.:
P63600/6153
Type:
Conference Proceedings

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