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Fundamental studies of the properties of photoresists based on resins containing polymerbound photoacid generators [6153-88]

Author(s):
Lee, C. -T. ( Georgia Institute of Technology (USA) )
Jarnagin, N. D. ( Univ. of North Carolina, Charlotte (USA) )
Wang, M. ( Univ. of North Carolina, Charlotte (USA) )
Gonsalves, k. E. ( Univ. of North Carolina, Charlotte (USA) )
Robert, J. M. ( Intel Corp. (USA) )
Yueh, W. ( Intel Corp. (USA) )
Henderson, C. L. ( Georgia Institute of Technology (USA) )
2 more
Publication title:
Advances in Resist Technology and Processing XXIII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6153
Pub. Year:
2006
Pt.:
2
Page(from):
61532E
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819461964 [0819461962]
Language:
English
Call no.:
P63600/6153
Type:
Conference Proceedings

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