Studies on cross-linking type positive 193nm photoresist material [6153-83]
- Author(s):
- Publication title:
- Advances in Resist Technology and Processing XXIII
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 6153
- Pub. Year:
- 2006
- Pt.:
- 1
- Page(from):
- 615329
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819461964 [0819461962]
- Language:
- English
- Call no.:
- P63600/6153
- Type:
- Conference Proceedings
Similar Items:
1
Conference Proceedings
Novel 193-nm positive photoresist composed of ester acetal polymer without phenyl group
SPIE - The International Society of Optical Engineering |
7
Conference Proceedings
Fundamental studies of the properties of photoresists based on resins containing polymerbound photoacid generators [6153-88]
SPIE - The International Society of Optical Engineering |
2
Conference Proceedings
Dissolution fundamentals of 193-nm methacrylate-based photoresists [6153-37]
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
5
Conference Proceedings
The deprotection reaction front profile in model 193 nm methacrylate-based chemically amplified photoresists [6153-43]
SPIE - The International Society of Optical Engineering |
11
Conference Proceedings
Process optimization of a negative-tone CVD photoresist for 193-nm lithography applications
SPIE - The International Society of Optical Engineering |
6
Conference Proceedings
The synthesis and properties of N-hydroxy maleopimarimide sulfonate derivatives as PAG and inhibitor for deep-UV photoresist
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |