Development of fluoropolymer for 193nm immersion lithography [6153-80]
- Author(s):
Shirota, N ( Asahi Glass Co Ltd (Japan) ) Takebe, Y ( Asahi Glass Co Ltd (Japan) ) Sasaki, T ( Asahi Glass Co Ltd (Japan) ) Yokokoji, O ( Asahi Glass Co Ltd (Japan) ) Toriumi, M ( Osaka Univ (Japan) ) Masuhara, H ( Osaka Univ (Japan) ) - Publication title:
- Advances in Resist Technology and Processing XXIII
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 6153
- Pub. Year:
- 2006
- Pt.:
- 1
- Page(from):
- 615324
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819461964 [0819461962]
- Language:
- English
- Call no.:
- P63600/6153
- Type:
- Conference Proceedings
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