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Resolution enhanced top anti-reflective coating materials for ArF immersion lithography [6153-74]

Author(s):
Jung, J C ( Hynix Semiconductor Inc. (South Korea) )
Lee, S K ( Hynix Semiconductor Inc. (South Korea) )
Ban, K D ( Hynix Semiconductor Inc. (South Korea) )
Bok C ( Hynix Semiconductor Inc. (South Korea) )
Kim H S ( Hynix Semiconductor Inc. (South Korea) )
Moon, S C ( Hynix Semiconductor Inc. (South Korea) )
Kim, J ( Hynix Semiconductor Inc. (South Korea) )
2 more
Publication title:
Advances in Resist Technology and Processing XXIII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6153
Pub. Year:
2006
Pt.:
1
Page(from):
61531Z
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819461964 [0819461962]
Language:
English
Call no.:
P63600/6153
Type:
Conference Proceedings

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