Blank Cover Image

Pattern defect study using cover material film in immersion lighography [6153-63]

Author(s):
Kawamura, D ( Toshiba Corp (Japan) )
Takeishi, T ( Toshiba Corp (Japan) )
Matsunaga, K ( Toshiba Corp (Japan) )
Shiobara, E ( Toshiba Corp (Japan) )
Oonishi, Y ( Toshiba Corp (Japan) )
Ito, S ( Toshiba Corp (Japan) )
1 more
Publication title:
Advances in Resist Technology and Processing XXIII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6153
Pub. Year:
2006
Pt.:
1
Page(from):
61531Q
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819461964 [0819461962]
Language:
English
Call no.:
P63600/6153
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings Contact hole shrink process with novel chemical shrink materials

Kawamura, D., Takeishi, T., Sho, K., Matsunaga, K., Shibata, N., Ozawa, K., Shimura, S., Kyoda, H., Kawasaki, T., …

SPIE - The International Society of Optical Engineering
7 Conference Proceedings Novel depolymerizable topcoat for immersion lighography [6153-60]

Zhang, P, Weigel, S J, Braymer, T, Markley, T, Ross, B, Jaramillo, M Jr, Cassel, S, Kiritsun O

SPIE - The International Society of Optical Engineering
2 Conference Proceedings LWR reduction in low-kl ArF-immersion lithography

K. Matsunaga, T. Oori, H. Kato, D. Kawamura, E. Shiobara

Society of Photo-optical Instrumentation Engineers
8 Conference Proceedings Dependence of resist profile on exposed area ratio

Shiobara,E., Kawamura,D., Matsunaga,K., Onishi,Y.

SPIE-The International Society for Optical Engineering
3 Conference Proceedings Resist edge roughness with reduced pattern size

Shiobara,E., Kawamura,D., Matsunaga,K., Koike,T., Mimotogi,S., Azuma,T., Onishi,Y.

SPIE-The International Society for Optical Engineering
9 Conference Proceedings Immersion topcoat and resist material improvement study by using immersion scanner [6153-13]

Nakagawa, H, Hoshiko, K, Shima, M, Kusumoto, S, Shimokawa, T, Nakano, K, Fujiwara, T, Owa, S

SPIE - The International Society of Optical Engineering
4 Conference Proceedings Influence of the watermark in immersion lithography process

Daisuke Kawamura, Tomoyuki Takeishi, Koutarou Sho, Kentarou Matsunaga, Naofumi Shibata, Kaoru Ozawa, Satoru Shimura, …

SPIE - The International Society of Optical Engineering
10 Conference Proceedings High-refractive-index fluids for the next-generation ArF immersion lighography [6153-10]

Wang, Y, Miyamatsu, T, Furukawa, T, Yamada, K, Tominaga, T, Makita, Y, Nakagawa, H, Nakamura, A, Shima, M, Kusumoto, S, …

SPIE - The International Society of Optical Engineering
5 Conference Proceedings Studies on immersion defects using mimic immersion experiments [6153-61]

Hanawa, T, Suganaga, T, Ishibashi, T, Maejima, S, Narimatsu, K, Suko, K, Terai, M, Kumada, T, Kitano, J

SPIE - The International Society of Optical Engineering
11 Conference Proceedings Materials and process parameters study on ArF immersion defectivity [6153-08]

Kanna, S, Inabe, H, Yamamoto, T, Tarutani, S, Kanda, H, Kenji, W, Kodama, K, Shitabatake, K

SPIE - The International Society of Optical Engineering
6 Conference Proceedings Improvement of watermark defect in immersion lighography: mechanism o fwatermark defect formation and its reduction by using alkaline-soluble immersion topcoat …

Nakagawa, H, Nakamura, A, Dougauchi, H, Shima, M, Kusmoto, S, Shimokawa, T

SPIE - The International Society of Optical Engineering
12 Conference Proceedings Defectivity reduction studies for ArF immersion lithography

K. Matsunaga, T. Kondoh, H. Kato, Y. Kobayashi, K. Hayasaki, S. Ito, A. Yoshida, S. Shimura, T. Kawasaki, H. Kyoda

SPIE - The International Society of Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12