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Analysis of 193-nm immersion specific defects [6153-62]

Author(s):
Otoguro, A ( Semiconductor Leading Edge Technologies, Inc (Japan) )
Lee, J W ( Semiconductor Leading Edge Technologies, Inc (Japan) )
Itani, T ( Semiconductor Leading Edge Technologies, Inc (Japan) )
Fujii, K ( Semiconductor Leading Edge Technologies, Inc (Japan) )
Funakoshi, T ( Hitachi High-Technologies Corp (Japan) )
Sakai, T ( Hitachi High-Technologies Corp (Japan) )
Watanabe, K ( Hitachi High-Technologies Corp (Japan) )
Arakawa, M ( Canon Inc (Japan) )
Nakano, H ( Canon Inc (Japan) )
Kobayashi, M ( Canon Inc (Japan) )
5 more
Publication title:
Advances in Resist Technology and Processing XXIII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6153
Pub. Year:
2006
Pt.:
1
Page(from):
61531P
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819461964 [0819461962]
Language:
English
Call no.:
P63600/6153
Type:
Conference Proceedings

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