Double exposure technology using silicon containing materials [6153-57]
- Author(s):
Lee, S. ( Hynix Semiconductor Inc. (South Korea) ) Jung, J. ( Hynix Semiconductor Inc. (South Korea) ) Cho, S. ( Hynix Semiconductor Inc. (South Korea) ) Lim, C.-M. ( Hynix Semiconductor Inc. (South Korea) ) Bok, C. ( Hynix Semiconductor Inc. (South Korea) ) Kim, H. ( Hynix Semiconductor Inc. (South Korea) ) Moon, S. ( Hynix Semiconductor Inc. (South Korea) ) Kim, J. ( Hynix Semiconductor Inc. (South Korea) ) - Publication title:
- Advances in Resist Technology and Processing XXIII
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 6153
- Pub. Year:
- 2006
- Pt.:
- 1
- Page(from):
- 61531K
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819461964 [0819461962]
- Language:
- English
- Call no.:
- P63600/6153
- Type:
- Conference Proceedings
Similar Items:
1
Conference Proceedings
Resolution enhanced top anti-reflective coating materials for ArF immersion lithography [6153-74]
SPIE - The International Society of Optical Engineering |
7
Conference Proceedings
Positive and negative tone double patterning lithography for 50nm flash memory [6154-37]
SPIE - The International Society of Optical Engineering |
2
Conference Proceedings
Development of multi-function hard mask to simplify process step [6153-108]
SPIE - The International Society of Optical Engineering |
8
Conference Proceedings
Optimization of material and process parameter for minimizing defect in implementation of MFHM process
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
9
Conference Proceedings
Cycloolefin copolymer containing hindered hydroxyl group for 1 93nm photoresist
SPIE - The International Society of Optical Engineering |
4
Conference Proceedings
High-performance 193-nm photoresist materials based on ROMA polymers: sub-90-nm contact hole application with resist reflow
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
5
Conference Proceedings
Ring opened maleic anhydride and norbornene copolymers (ROMA) have a good character in resist flow process for 193-nm resist technology
SPIE-The International Society for Optical Engineering |
11
Conference Proceedings
Improvement of alignment and overlay accuracy on amorphous carbon layers [6152-73]
SPIE - The International Society of Optical Engineering |
SPIE - The International Society for Optical Engineering |
12
Conference Proceedings
Feasibility study of mask fabrication in double exposure technology [6349-67]
SPIE - The International Society of Optical Engineering |