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Changes of chemical nature of photoresists induced by various plasma treatments and their impact on LWR [6153-46]

Author(s):
Kawahira, H. ( Sony Corp. (Japan) )
Matsuzawa, N. N. ( Sony Corp. (Japan) )
Matsui, E. ( Sony Corp. (Japan) )
Ando, A. ( Sony Corp. (Japan) )
Salam, K. M. A. ( Sony Corp. (Japan) )
Yoshida, M. ( Sony Corp. (Japan) )
Yamaguchi, Y. ( Sony Corp. (Japan) )
Kugimiya, K. ( Sony Corp. (Japan) )
Tatsumi, T. ( Sony Corp. (Japan) )
Nakano, H. ( Sony Corp. (Japan) )
Iwai, T. ( Tokyo Ohka Kogyo Co. Ltd. (Japan) )
Irie, M. ( Tokyo Ohka Kogyo Co. Ltd. (Japan) )
7 more
Publication title:
Advances in Resist Technology and Processing XXIII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6153
Pub. Year:
2006
Pt.:
1
Page(from):
615319
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819461964 [0819461962]
Language:
English
Call no.:
P63600/6153
Type:
Conference Proceedings

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