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Resist process window characterization for the 45-nm node using an interferometric immersion microstepper [6153-27]

Author(s):
  • Bourov A ( Rochester Institute of Technology (USA) and Amphibian Systems (USA) )
  • Robertson S A ( Rohm and Haas Electronic Materials (USA) )
  • Smith B W ( Amphibian Systems (USA) )
  • Slocum M A ( Amphibian Systems (USA) )
  • Piscani E C ( Amphibian Systems (USA) )
Publication title:
Advances in Resist Technology and Processing XXIII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6153
Pub. Year:
2006
Pt.:
1
Page(from):
61530R
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819461964 [0819461962]
Language:
English
Call no.:
P63600/6153
Type:
Conference Proceedings

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