Silicon containing polymer in applications for 193-nm high-NA lithography processes [6153-20]

Silicon containing polymer in applications for 193-nm high-NA lithography processes [6153-20]

Author(s):

Burns, S ( IBM Thomas J Watson Research Ctr (USA) )

Pfeiffer, D ( IBM Thomas J Watson Research Ctr (USA) )

Mahorowala, A ( IBM Thomas J Watson Research Ctr (USA) )

Petrillo, K

Clancy, A ( IBM Thomas J Watson Research Ctr (USA) )

Babich, K ( IBM Thomas J Watson Research Ctr (USA) )

Medeiros D ( IBM Thomas J Watson Research Ctr (USA) )

Allen, S ( IBM Microelectronics Division (USA) )

Holmes, S ( IBM Microelectronics Division (USA) )

Crouse, M ( IBM Microelectronics Division (USA) )

Brodsky, C ( IBM Microelectronics Division (USA) )

Pham, V ( IBM Microelectronics Division (USA) )

Lin, Y H ( IBM Microelectronics Division (USA) )

Patel, K ( IBM Microelectronics Division (USA) )

Lustig, N ( IBM Microelectronics Division (USA) )

Gabor, A ( IBM Microelectronics Division (USA) )

Sheraw, C ( IBM Microelectronics Division (USA) )

Brock, P ( IBM Almaden Research Ctr (USA) )

Larson, C ( IBM Almaden Research Ctr (USA) )

14 more

Publication title:

Advances in Resist Technology and Processing XXIII

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

6153

Pub. Year:

2006

Pt.:

1

Page(from):

61530K

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819461964 [0819461962]

Language:

English

Call no.:

P63600/6153

Type:

Conference Proceedings

Details

TDL ID:	ZA00016185
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Advances in Resist Technology and Processing
Conf. info. (Number):	2006 : 23th
Conf. info. (Venue):	San Jose, CA, USA
Conf. info. (Date):	2006.02.20-2006.02.22

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