Immersion topcoat and resist material improvement study by using immersion scanner [6153-13]

Author(s):

Nakagawa, H ( JSR Corp (Japan) )

Hoshiko, K ( JSR Corp (Japan) )

Shima, M ( JSR Corp (Japan) )

Kusumoto, S ( JSR Corp (Japan) )

Shimokawa, T ( JSR Corp (Japan) )

Nakano, K ( Nikon Corp (Japan) )

Fujiwara, T ( Nikon Corp (Japan) )

Owa, S ( Nikon Corp (Japan) )

3 more

Publication title:

Advances in Resist Technology and Processing XXIII

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

6153

Pub. Year:

2006

Pt.:

1

Page(from):

61530D

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819461964 [0819461962]

Language:

English

Call no.:

P63600/6153

Type:

Conference Proceedings