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High-refractive-index fluids for the next-generation ArF immersion lighography [6153-10]

Author(s):
Wang, Y ( JSR Corp (Japan) )
Miyamatsu, T ( JSR Corp (Japan) )
Furukawa, T ( JSR Corp (Japan) )
Yamada, K ( JSR Corp (Japan) )
Tominaga, T ( JSR Corp (Japan) )
Makita, Y ( JSR Corp (Japan) )
Nakagawa, H ( JSR Corp (Japan) )
Nakamura, A ( JSR Corp (Japan) )
Shima, M ( JSR Corp (Japan) )
Kusumoto, S ( JSR Corp (Japan) )
Shimokawa, T ( JSR Corp (Japan) )
Hieda, K ( JSR Corp (Japan) )
7 more
Publication title:
Advances in Resist Technology and Processing XXIII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6153
Pub. Year:
2006
Pt.:
1
Page(from):
61530A
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819461964 [0819461962]
Language:
English
Call no.:
P63600/6153
Type:
Conference Proceedings

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