65-nm photolithography process window qualification study with advanced e-beam metrology and inspection systems [6152-188]

65-nm photolithography process window qualification study with advanced e-beam metrology and inspection systems [6152-188]

Author(s):

Hsu, R. H ( United Microelectronics Corp. (Taiwan) )
Lin, B. S. M ( United Microelectronics Corp. (Taiwan) )
Wu, W. Y ( Hermes Systems (Taiwan) )
Xiao, H ( Hermes Microvision )
Jau, J ( Hermes Microvision, Inc. USA (USA) )

Publication title:

Metrology, Inspection, and Process Control for Microlithography XX

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

6152

Pub. Year:

2006

Pt.:

2

Page(from):

61524K

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819461957 [0819461954]

Language:

English

Call no.:

P63600/6152

Type:

Conference Proceedings

Details

TDL ID:	ZA00016184
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Metrology, Inspection, and Process Control for Microlithography
Conf. info. (Number):	2006 : 20th
Conf. info. (Venue):	San Jose, CA, USA
Conf. info. (Date):	2006.02.20-2006.02.23

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