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ArF photo resist pattern sample preparation method using FIB without protective coating [6152-165]

Author(s):
Okushima, H. ( Hitachi High-Technologies Corp. (Japan) )
Onozuka, T. ( Hitachi High-Technologies Corp. (Japan) )
Kuroda, Y. ( Hitachi High-Technologies Corp. (Japan) )
Yaguchi, T. ( Hitachi High-Technologies Corp. (Japan) )
Umemura, K. ( Hitachi High-Technologies Corp. (Japan) )
Tamochi, R ( Hitachi High-Technologies Corp. (Japan) )
Watanabe, K. ( Hitachi High-Technologies Corp. (Japan) )
Hasegawa, H ( Hitachi High-Technologies Corp. (Japan) )
Kawata, I. ( Hitachi High-Technologies Corp. (Japan) )
Rijpers, B.
5 more
Publication title:
Metrology, Inspection, and Process Control for Microlithography XX
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6152
Pub. Year:
2006
Pt.:
2
Page(from):
615244
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819461957 [0819461954]
Language:
English
Call no.:
P63600/6152
Type:
Conference Proceedings

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