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Comparison of I-line and DUV high-energy implant litho processes [6152-155]

Author(s):
  • Grandpierre, A G. ( Infineon Technologies SC300 GmbH &Co. OHG (Germany) )
  • Berger, C. ( Infineon Technologies SC300 GmbH &Co. OHG (Germany) )
  • Schroeder, U. P. ( Infineon Technologies North America (USA) )
  • Schiwon, R. ( Infineon Technologies SC300 GmbH & Co. OHG (Germany) )
  • Kubis, M. ( Infineon Technologies SC300 GmbH & Co. OHG (Germany) )
Publication title:
Metrology, Inspection, and Process Control for Microlithography XX
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6152
Pub. Year:
2006
Pt.:
2
Page(from):
61523V
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819461957 [0819461954]
Language:
English
Call no.:
P63600/6152
Type:
Conference Proceedings

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