Overlay improvement by using new framework of grid compensation for matching [6152-129]

Overlay improvement by using new framework of grid compensation for matching [6152-129]

Author(s):

Sukegawa, A. ( Nikon Corp. (Japan) )
Wakamoto, S. ( Nikon Corp. (Japan) )
Nakajima, S. ( Nikon Corp. (Japan) )
Kawakubo, M. ( Nikon Corp. (Japan) )
Maome, N. ( Nikon Corp. (Japan) )

Publication title:

Metrology, Inspection, and Process Control for Microlithography XX

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

6152

Pub. Year:

2006

Pt.:

2

Page(from):

61523A

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819461957 [0819461954]

Language:

English

Call no.:

P63600/6152

Type:

Conference Proceedings

Details

TDL ID:	ZA00016184
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Metrology, Inspection, and Process Control for Microlithography
Conf. info. (Number):	2006 : 20th
Conf. info. (Venue):	San Jose, CA, USA
Conf. info. (Date):	2006.02.20-2006.02.23

Similar Items:

1 Conference Proceedings Improved overlay control through automated high order compensation S. Wakamoto, Y. Ishii, K. Yasukawa, A. Sukegawa, S. Maejima, A. Kato, J. C. Robinson, B. J. Eichelberger, P. Izikson, M. … SPIE - The International Society of Optical Engineering	7 Conference Proceedings Improving scanner productivity and control through innovative connectivity application [6152-168] Ishill, Y., Wakamoto, S., Kato, A., Eichelberger, B. SPIE - The International Society of Optical Engineering
2 Conference Proceedings Outlier rejection with mixture models in alignment Nakajima, S., Kanaya, Y., Li, M., Sugihara, T., Sukegawa, A., Magome, N. SPIE-The International Society for Optical Engineering	8 Conference Proceedings Introduction of new techniques for matching overlay enhancement Kikuchi,T., Ishii,Y., Tokuda,N. SPIE-The International Society for Optical Engineering
3 Conference Proceedings New method to reduce alignment error by optical system Nagayama, T., Nakajima, S., Sugaya, A., Kanaya, Y., Sukegawa, A. SPIE-The International Society for Optical Engineering	9 Conference Proceedings New fast adaptive matching criterion for block-based motion compensation Farouk,H., Mashali,S.A., Rashwan,M., Nassar,A. SPIE-The International Society for Optical Engineering
4 Conference Proceedings Improvement of alignment and overlay accuracy on amorphous carbon layers [6152-73] Hwang, Y. S., Kang, E., Lee, K., Ban, K. D, Bok, C. K., Lim, C. M., Kim, H. S, Moon, S. C. SPIE - The International Society of Optical Engineering	10 Conference Proceedings New advanced lithography tools with mix-and-match strategy Ishikawa, J., Nei, M., Hamatani, M., Wakamoto, S., Umatate, T. SPIE - The International Society of Optical Engineering
5 Conference Proceedings In-chip overlay metrology [6152-40] Ku, Y. S., Tung, C. H., Li, Y. P., Pang, H. L., Smith, N. P., Binns, L., Rigden, T., Reynolds, G., Fink, H. SPIE - The International Society of Optical Engineering	11 Conference Proceedings A system to optimize mix-and-match overlay in lithography S. Wakamoto, Y. Ishii, K. Yasukawa, S. Maejima, A.Kato Society of Photo-optical Instrumentation Engineers
6 Conference Proceedings Shape Optimization Using an Adjoint Variable Method in ITBL Grid Environment K. Shinohara, H. Okuda, S. Ito, N. Nakajima, M. Ida American Society of Mechanical Engineers	12 Conference Proceedings Color matching using dot gain and intensity compensation for different papers Lee,C.H., Lee,C.S., Kim,K.M., Ha,Y.H. SPIE-The International Society for Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12