Critical dimension AFM tip characterization and image reconstruction applied to the 45-nm node [6152-107]
- Author(s):
Dahlen, G. ( Veeco Instruments, Inc. (USA) ) Osborn, M. ( Veeco Instruments, Inc. (USA) ) Liu, H. C. ( Veeco Instruments, Inc. (USA) ) Jain, R. ( Veeco Instruments, Inc. (USA) ) Foreman, W. ( Veeco Instruments, Inc. (USA) ) Osborne, J. R. ( Veeco Instruments, Inc. (USA) ) - Publication title:
- Metrology, Inspection, and Process Control for Microlithography XX
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 6152
- Pub. Year:
- 2006
- Pt.:
- 2
- Page(from):
- 61522R
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819461957 [0819461954]
- Language:
- English
- Call no.:
- P63600/6152
- Type:
- Conference Proceedings
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