EUV wavefront metrology at EUVA [6152-104]

Author(s):

Ouchi, C. ( Extreme Ultraviolet Lithography System Development Association (Japan) )

Kato, S. ( Extreme Ultraviolet Lithography System Development Association (Japan) )

Hasegawa, M. ( Extreme Ultraviolet Lithography System Development Association (Japan) )

Hasegawa, T. ( Extreme Ultraviolet Lithography System Development Association (Japan) )

Yokota, H. ( Extreme Ultraviolet Lithography System Development Association (Japan) )

Sugisaki, K. ( Extreme Ultraviolet Lithography System Development Association (Japan) )

Okada, M. ( Extreme Ultraviolet Lithography System Development Association (Japan) )

Murakami, K. ( Extreme Ultraviolet Lithography System Development Association (Japan) )

Saito, J. ( Extreme Ultraviolet Lithography System Development Association (Japan) )

Nilbe, M. ( Univ. of Hyogo (Japan) )

Takeda, M.

6 more

Publication title:

Metrology, Inspection, and Process Control for Microlithography XX

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

6152

Pub. Year:

2006

Pt.:

2

Page(from):

61522O

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819461957 [0819461954]

Language:

English

Call no.:

P63600/6152

Type:

Conference Proceedings