EUV wavefront metrology at EUVA [6152-104]
- Author(s):
Ouchi, C. ( Extreme Ultraviolet Lithography System Development Association (Japan) ) Kato, S. ( Extreme Ultraviolet Lithography System Development Association (Japan) ) Hasegawa, M. ( Extreme Ultraviolet Lithography System Development Association (Japan) ) Hasegawa, T. ( Extreme Ultraviolet Lithography System Development Association (Japan) ) Yokota, H. ( Extreme Ultraviolet Lithography System Development Association (Japan) ) Sugisaki, K. ( Extreme Ultraviolet Lithography System Development Association (Japan) ) Okada, M. ( Extreme Ultraviolet Lithography System Development Association (Japan) ) Murakami, K. ( Extreme Ultraviolet Lithography System Development Association (Japan) ) Saito, J. ( Extreme Ultraviolet Lithography System Development Association (Japan) ) Nilbe, M. ( Univ. of Hyogo (Japan) ) Takeda, M. - Publication title:
- Metrology, Inspection, and Process Control for Microlithography XX
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 6152
- Pub. Year:
- 2006
- Pt.:
- 2
- Page(from):
- 61522O
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819461957 [0819461954]
- Language:
- English
- Call no.:
- P63600/6152
- Type:
- Conference Proceedings
Similar Items:
SPIE - The International Society of Optical Engineering |
7
Conference Proceedings
Lateral shearing interferometer for EUVL: theoretical analysis and experiment
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
4
Conference Proceedings
Development of an experimental EUV interferometer for benchmarking several EUV wavefront metrology schemes
SPIE-The International Society for Optical Engineering |
10
Conference Proceedings
Development of illumination optics and projection optics for high-NA EUV exposure tool (HiNA)
SPIE-The International Society for Optical Engineering |
5
Conference Proceedings
Evaluation of contamination deposition on pinholes used in EUV at-wavelength PDI
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
12
Conference Proceedings
Effect ofresidual gas atmosphere on lifetime of Ru-capped EUVl projection optics mirror [6151-17]
SPIE - The International Society of Optical Engineering |