Blank Cover Image

CD variations correction by local transmission control of photomasks done with a novel laser-based process [6152-76]

Author(s):
Publication title:
Metrology, Inspection, and Process Control for Microlithography XX
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6152
Pub. Year:
2006
Pt.:
2
Page(from):
615225
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819461957 [0819461954]
Language:
English
Call no.:
P63600/6152
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings Irradiation resistance of intravolume shading elements embedded in photomasks used for CD uniformity control by local intra-field transmission attenuation …

Zait, E., Ben-Zvi, G., Dmitriev, V., Oshemkov, S., UCLT Ltd. (Israel), Pforr, R., Henning, M.

SPIE - The International Society of Optical Engineering
7 Conference Proceedings Very high sensitivity mask transmittance mapping and measurements based on non imaging optics with Galileo

G. Ben-Zvi, V. Dmitriev, E. Graitzer, E. Zait, O. Sharoni

Society of Photo-optical Instrumentation Engineers
2 Conference Proceedings In-field CD uniformity control by altering transmission distribution of the photomask using ultra fast pulsed laser technology [6283-29]

Morikawa, Y., Sutou, T., Inazuki, Y., Adachi, T., Yoshida, Y., Kojima, K., Sasaki, S., Mohri, H., Hayashi, N., Dmitriev, …

SPIE - The International Society of Optical Engineering
8 Conference Proceedings Very high sensitivity mask DUV transmittance mapping and measurements based on non-imaging optics

G. Ben-Zvi, V. Dmitriev, E. Graitzer, E. Zait, O. Sharoni

Society of Photo-optical Instrumentation Engineers
3 Conference Proceedings The effect of intra-field CD uniformity control (CDC) on mask birefringence

G. Ben-Zvi, E. Zait, V. Krugliakov, V. Dmitriev, G. Gottlieb, S. Oshemkov

SPIE - The International Society of Optical Engineering
9 Conference Proceedings Detection of progressive fransmission loss due to haze with Galileo mask DUV transmittance mapping based on non imaging optics

S. Labovitz, G. Ben-Zvi, V. Dmitriev, E. Graitzer, E. Zait

Society of Photo-optical Instrumentation Engineers
4 Conference Proceedings Photomask clear defects repair using ultrafast laser technology

Ben-Zvi, G., Guletsky, N., Dmitriev, V.J., Oshemkov, S.V., Zait, E.

SPIE - The International Society of Optical Engineering
10 Conference Proceedings Ultrafast laser induced controllable jet in liquid

S. Oshemkov, L. Dvorkin, V. Dmitriev

Society of Photo-optical Instrumentation Engineers
5 Conference Proceedings Mask CD control (CDC) using AIMS as the CD metrology data source

G. Ben-Zvi, E. Zait, V. Dmitriev, S. Labovitz, E. Graitzer

Society of Photo-optical Instrumentation Engineers
11 Conference Proceedings CD variation sources of photomask

Kim,B.G., Choi,S.W., Yu,Y.H., Yoon,H.S., Sohn,J.M.

SPIE-The International Society for Optical Engineering
6 Conference Proceedings Mask CD control (CDC) with ultrafast laser for improving mask CDU using AIMS as the CD metrology data source

G. Ben-Zvi, E. Zait, V. Dmitriev, E. Graitzer, G. Gottlieb

Society of Photo-optical Instrumentation Engineers
12 Conference Proceedings Flare-induced CD variation correction using transmittance controlled mask

Nam, D.-S., Yeo, G.-S., Park, J.R., Choi, S.-W., Woo, S.-G., Cho, H.-K., Han, W.-S.

SPIE-The International Society for Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12