Improvement of alignment and overlay accuracy on amorphous carbon layers [6152-73]
- Author(s):
Hwang, Y. S. ( Hynix Semiconductor Inc. (South Korea) ) Kang, E. ( Hynix Semiconductor Inc. (South Korea) ) Lee, K. ( Hynix Semiconductor Inc. (South Korea) ) Ban, K. D ( Hynix Semiconductor Inc. (South Korea) ) Bok, C. K. ( Hynix Semiconductor Inc. (South Korea) ) Lim, C. M. ( Hynix Semiconductor Inc. (South Korea) ) Kim, H. S ( Hynix Semiconductor Inc. (South Korea) ) Moon, S. C. ( Hynix Semiconductor Inc. (South Korea) ) - Publication title:
- Metrology, Inspection, and Process Control for Microlithography XX
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 6152
- Pub. Year:
- 2006
- Pt.:
- 1
- Page(from):
- 615222
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819461957 [0819461954]
- Language:
- English
- Call no.:
- P63600/6152
- Type:
- Conference Proceedings
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