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Improvement of alignment and overlay accuracy on amorphous carbon layers [6152-73]

Author(s):
Hwang, Y. S. ( Hynix Semiconductor Inc. (South Korea) )
Kang, E. ( Hynix Semiconductor Inc. (South Korea) )
Lee, K. ( Hynix Semiconductor Inc. (South Korea) )
Ban, K. D ( Hynix Semiconductor Inc. (South Korea) )
Bok, C. K. ( Hynix Semiconductor Inc. (South Korea) )
Lim, C. M. ( Hynix Semiconductor Inc. (South Korea) )
Kim, H. S ( Hynix Semiconductor Inc. (South Korea) )
Moon, S. C. ( Hynix Semiconductor Inc. (South Korea) )
3 more
Publication title:
Metrology, Inspection, and Process Control for Microlithography XX
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6152
Pub. Year:
2006
Pt.:
1
Page(from):
615222
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819461957 [0819461954]
Language:
English
Call no.:
P63600/6152
Type:
Conference Proceedings

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