In-line semi-electrical process diagnosis methodology for integrated process window optimization of 65nm and below technology nodes [6152-67]

In-line semi-electrical process diagnosis methodology for integrated process window optimization of 65nm and below technology nodes [6152-67]

Author(s):

Lei, M. T. ( Taiwan Semiconductor Manufacturing Co. (Taiwan) )

Tang, K. H. ( Taiwan Semiconductor Manufacturing Co. (Taiwan) )

Wang, Y. C. ( Taiwan Semiconductor Manufacturing Co. (Taiwan) )

Huang, C. H. ( Taiwan Semiconductor Manufacturing Co. (Taiwan) )

Jeng, C. C. ( Taiwan Semiconductor Manufacturing Co. (Taiwan) )

Wang, L. K. ( Hermes Microvision Inc. (USA) )

Fang, W. ( Hermes Microvision Inc. (USA) )

Zhao, Y. ( Hermes Microvision Inc. (USA) )

Jau, J. ( Hermes Microvision Inc. (USA) )

Hsia, C. C.

5 more

Publication title:

Metrology, Inspection, and Process Control for Microlithography XX

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

6152

Pub. Year:

2006

Pt.:

1

Page(from):

61521T

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819461957 [0819461954]

Language:

English

Call no.:

P63600/6152

Type:

Conference Proceedings

Details

TDL ID:	ZA00016184
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Metrology, Inspection, and Process Control for Microlithography
Conf. info. (Number):	2006 : 20th
Conf. info. (Venue):	San Jose, CA, USA
Conf. info. (Date):	2006.02.20-2006.02.23

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