Development of an automated multiple-target mask CD disposition system to enable new sampling strategy [6152-58]
- Author(s):
Ma, J. ( Intel Corp. (USA) ) Farnsworth, J. ( Intel Corp. (USA) ) Bassist, L. ( Intel Corp. (USA) ) Cui, Y. ( Intel Corp. (USA) ) Mammen, B. ( Intel Corp. (USA) ) Padmanaban, R. ( Intel Corp. (USA) ) Nadamuni, V. ( Intel Corp. (USA) ) Kamath, M. ( Intel Corp. (USA) ) Buckmann, K. ( Intel Corp. (USA) ) Neff, J. ( Intel Corp. (USA) ) Freiberger, P. - Publication title:
- Metrology, Inspection, and Process Control for Microlithography XX
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 6152
- Pub. Year:
- 2006
- Pt.:
- 1
- Page(from):
- 61521K
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819461957 [0819461954]
- Language:
- English
- Call no.:
- P63600/6152
- Type:
- Conference Proceedings
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